Comit 
          has taped out multi million gate ASICs with multiple 
          clock domains. Recent designs are targeted to cutting 
          edge 130nm processes in Low Voltage Fluro-Silicate-Glass 
          and LV OD.
        Comit's 
          knowledge of front-end RTL design as well as back-end physical layout 
          ensures tight coupling in concurrent RTL physical design strategies. 
          Comit's experience in multi-million gate hierarchical design with industry 
          standard design tools ensures early management of pitfalls such as channel 
          routing and horizon effects.
        ASIC 
          Layout Services
           Starting 
          with a gate level netlist handoff, generate and insert: 
          - TAP Controllers 
          - Boundary scan 
         
          Generate: 
          - IOLIOH vectors 
          - DC parametrics 
          - Connectivity tests for multiple dies in a package 
         
          Generate ASIC top level including 
          - I/O Muxes 
          - Pad ring 
         
          Generate Scripts for 
          - die layout tools 
          - packaging and test tools 
         
          Perform: 
          - Floorplanning 
          - Power & Ground Strap generation and placement 
          - Automatic & Manual I/O Placement 
          - Clock tree synthesis 
          - Place & Route 
          - Parasitic extraction 
          - Timing closure 
          - DRC 
          - LVS 
          - Crosstalk
            
        Comit's 
          experience with a variety of silicon vendors virtually guarantees your 
          designs will work first time.  Comit has targeted designs to Agere, 
          Lucent, NEC, OKI, 
          TSMC and UMC. Familiarity with silicon vendor process 
          design kits and third-party libraries, and knowledge of foundry 
          sign off parameters including foundry-preferred layer mapping 
          tables and verification grids, metal coverage rule 
          and antenna rule checks, and knowledge of specific process parameters 
          relating to RC extraction etc. minimizes your risk, and has contributed 
          to Comit's unbroken record of first silicon success.
        Knowledge 
          of Reticle Enhancement Techniques (RET) such as optical and process 
          correction, phase-shift mask, scattering bars and off-axis illumination 
          ensures that Comit can work with your silicon vendor on physical verification 
          of sub-wavelength designs.